Nano-electronics research center imec and Nova Measuring Instruments (Nasdaq: NVMI), a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor ...
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Huawei pushes toward 2 nm chips without EUV
In a development that could reshape the global semiconductor race, Huawei filed a patent outlining a path to 2 nm-class chip production using only deep-ultraviolet (DUV) lithography tools – the very ...
As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...
Advanced logic scaling has created some difficult technical challenges, including a requirement for highly dense patterning. Imec recently confronted this challenge, by working toward the use of Metal ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
The recent San Francisco Bay Area Council IEEE Nanotechnologyconference addressed the issue of nanoelectronics forsub-20-nm processes. The speakers—from Applied Materials,TSMC (Taiwan Semiconductor ...
Sym3® Y tailored to critical conductor etch applications in 3D NAND, DRAM and foundry-logic nodes Newest offering broadens adoption of the fastest-ramping product in company history Milestone reached: ...
Leuven, Belgium, and San Jose, CA. Nano-electronics research center imec and Cadence Design Systems Inc. today announced that the companies completed the first tapeout of a 5-nm test chip using ...
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