Abstract: Overlay accuracy is a fundamental indicator of a photolithography machine performance. Misalignment between the mask and wafer is the main factor affecting overlay accuracy. The ...
Abstract: A millimeter-wave CMOS active vector-sum phase shifter (VSPS) with a phase resolution of 5.625° using a two-stage transformer-based resistor and inductor (RL) polyphase filter (PPF) for ...
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